Powering Future Technology Nodes | PFTN semiconductor

August 27–28, 2026 – The 10th MOS-AK China International Conference on Device Modeling was held at the Wuxi Campus of Southeast University. Under the theme "AI-Driven Device Modeling," the conference was co-organized by the Device Modeling Professional Branch (in preparation) of the China Semiconductor Industry Association, the Yangtze River Delta Integrated Circuit Industrial Application Technology Innovation Center, and the IEEE Nanjing Section, and was hosted by the School of Integrated Circuits at Southeast University, the Wuxi Campus of Southeast University, and the Asia-Pacific Science and Technology Association (APSTA).

The conference featured keynote speeches, invited presentations, five thematic forums, a roundtable discussion, project exhibitions, and on-site EDA training sessions, with discussions spanning silicon photonics and optoelectronic devices, 2.5D/3D advanced packaging, RF and ultra-wide-bandgap semiconductors, ultra-low-temperature quantum and memory devices, as well as device characterization, parameter extraction, and foundry interface strategies.

During the conference, PFTN delivered a featured technical presentation and hands-on student training sessions, sharing practical achievements in China’s EDA technology with researchers and engineers in the integrated circuit field.

Dr. Shen Chen presented a technical report titled”Fully Automated Compact Modeling Workflow for Transistors and Interconnects and Its Application in DTCO for Advanced Logic Platforms." The report highlighted that DTCO is a critical component in the development of advanced logic platforms, while traditional block-level DTCO workflows are hindered by a multitude of tools and protracted timelines. PFTN's proprietary fully automated SPICE model extraction tool, empowered by algorithmic optimization and flow automation, enables efficient extraction of compact model parameters from device characteristics, significantly shortening the modeling cycle. The presentation focused on the algorithm principles and practical application results of the tool, and also shared its integration scheme within a fully automated DTCO workflow, offering new approaches for co-optimization in advanced process platforms.

Concurrently, engineers Ling Runyao and Yang Tianwei conducted a student training session titled "TCAD Applications of the 55nm CMOS – A Practical Sharing Based on the China-Developed Mozz TCAD Simulation Platform." Using the 55nm CMOS process as a case study, the session provided a complete walkthrough of the Mozz Process and Mozz Device simulation workflows, covering process modeling, physical model configuration, and simulation-to-measurement correlation through hands-on exercises. The training also explored practical TCAD application scenarios in research and engineering. For students attending, PFTN launched an exclusive academic package, including a two-month trial license for the personal academic edition of its TCAD suite, access to simulation case study libraries, and dedicated technical support services, aimed at facilitating integrated circuit research at universities.

Through the MOS-AK conference, PFTN not only demonstrated its technical expertise in DTCO modeling automation and TCAD simulation but also garnered direct feedback from both academia and industry. The company remains committed to advancing the independent development and engineering application of China's homegrown EDA tools, providing core support for the integrated circuit industry.