Powering Future Technology Nodes | PFTN semiconductor

Shanghai, May 26, 2026 — Shanghai Peifeng Tunan Semiconductor Co., Ltd. officially released the 2026.04 version of its process and device simulation suite, Mozz TCAD. As the first TCAD toolkit in China to support full 3D process and 3D device simulation capabilities, Mozz TCAD continues to help users overcome the long-standing "bottleneck" of dependency on imported EDA tools in the development of advanced semiconductors, supporting independent control of the full process from R&D to mass production.

This 2026.04 release delivers significant improvements in overall simulation efficiency, solver stability, model accuracy, and user convenience. The newly added mixed-mode simulation capability, integrated into the Mozz Device, extends the analysis scope from device level to circuit level, further shortening the design iteration cycle from process modeling to system validation and providing users with a smoother, more reliable simulation experience.

The suite provides full coverage across process simulation, 3D process topography simulation, device simulation, parasitic extraction, visualization, and an integrated workbench environment. As a cornerstone of the Peifeng Tunan EDA portfolio, it forms a complete DTCO software ecosystem.